题名 | Four-wave peak mid-infrared graphene surface plasmons absorber based on circular and orthogonal double ellipses |
作者 | |
发表日期 | 2023-05 |
发表期刊 | DIAMOND AND RELATED MATERIALS 影响因子和分区 |
语种 | 英语 |
原始文献类型 | Article |
关键词 | Four -band perfect absorber Graphene High sensitivity Tunable Four-band perfect absorber |
其他关键词 | IMPRINTED ELECTROCHEMICAL SENSOR ; QUANTUM DOTS ; SENSITIVITY ; ABSORPTION |
摘要 | This paper proposes a four-wave peak narrow-band surface patterned graphene absorber based on surface plasmon resonance (SPR). The absorber is divided into three layers; the bottom layer (reflective layer) consists of Ag, the middle layer (dielectric layer) consists of silica, and the top layer (absorber material layer) of patterned graphene consists of a circle surrounding two orthogonal ellipses with a circle etched off in the middle. After analyzing and comparing the structure of different parameters of the top graphene pattern, we demonstrate the superiority of the simulation results of the used graphical parameters. This absorber top graphic structure is simple, with low machining difficulty and processing cost, and can be manufactured quantitatively. The FiniteDifference Time Domain (FDTD) simulation data in the mid-infrared waveband from 3000 nm to 3550 nm shows that this absorber structure has four perfect absorber crests. The absorption peaks at the resonance wavelengths of 3137.56 nm, 3177.06 nm, 3264.16 nm and 3394.12 nm were 98.72 %, 99.33 %, 99.97 % and 98.28 %, respectively. The average absorption of the four absorption peaks reached 99.07 %. The simulation reveals that the resonance wavelength can be controlled by the chemical potential and relaxation time of the graphene layer and by adjusting the refractive index of the silica layer. The absorber is insensitive to changes in the tilt angle and polarization mode of the incident light. At the same time, it is very sensitive to changes in the external environment refractive index. The sensitivity of the four absorption peaks was calculated to be 1004.22 nm/RIU, 1073.31 nm/RIU, 1114.01 nm/RIU and 1161.11 nm/RIU. The absorber has a variety of properties that make it highly useful in the fields of mid-infrared thermal radiation sensing, mid-infrared detectors and sensors, and environmental monitoring sensors. |
资助项目 | National Natural Science Foundation of China [11774054, 12075036]; Open Fund of Hubei Key Laboratory of Mechanical Transmission and Manufacturing Engineering at Wuhan University of Science and Technology [MTMEOF2021B02]; Opening Project of Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences; 2022 Scientific Research Project of Huzhou College [2022HXKM07]; College Students' Innovation and Entrepreneurship Training Program [S202110619073, S202110619069]; undergraduate Innovation Fund Project of SWUST [CX 21-099, LX2020010, CX21-008] |
出版者 | ELSEVIER SCIENCE SA |
ISSN | 0925-9635 |
EISSN | 1879-0062 |
卷号 | 135 |
DOI | 10.1016/j.diamond.2023.109901 |
页数 | 12 |
WOS类目 | Materials Science, Multidisciplinary ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter |
WOS研究方向 | Materials Science ; Physics |
WOS记录号 | WOS:000967185700001 |
收录类别 | SCIE ; EI ; SCOPUS |
在线发表日期 | 2023-04 |
EI入藏号 | 20231413832288 |
EI主题词 | Graphene |
EI分类号 | 741.1 Light/Optics ; 761 Nanotechnology ; 804 Chemical Products Generally ; 921 Mathematics |
URL | 查看原文 |
SCOPUSEID | 2-s2.0-85151300654 |
通讯作者地址 | [Yi, Zao]Joint Laboratory for Extreme Conditions Matter Properties,Southwest University of Science and Technology,Mianyang,621010,China ; [Zeng, Liangcai]Key Laboratory of Metallurgical Equipment and Control Technology of Ministry of Education,Wuhan University of Science and Technology,Wuhan,430081,China ; [Zhang, Libing]School of Mechatronic Engineering and Automation,Shanghai University,Shanghai,200072,China |
Scopus学科分类 | Electronic, Optical and Magnetic Materials;Chemistry (all);Mechanical Engineering;Physics and Astronomy (all);Materials Chemistry;Electrical and Electronic Engineering |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | https://kms.wmu.edu.cn/handle/3ETUA0LF/174811 |
专题 | 眼视光学院(生物医学工程学院)、附属眼视光医院 仁济学院_眼视光、生物医学工程学部 |
通讯作者 | Yi, Zao; Zeng, Liangcai; Zhang, Libing |
作者单位 | 1.Joint Laboratory for Extreme Conditions Matter Properties,Southwest University of Science and Technology,Mianyang,621010,China; 2.Department of Electronics,School of Electronic Information,Huzhou College,Huzhou,313000,China; 3.Yangtze Delta Region Institute (Huzhou),University of Electronic Science and Technology of China,Huzhou,313001,China; 4.School of Science,Lanzhou University of Technology,Lanzhou,730050,China; 5.Key Laboratory of Metallurgical Equipment and Control Technology of Ministry of Education,Wuhan University of Science and Technology,Wuhan,430081,China; 6.Key Laboratory of Microelectronic Devices and Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences,Beijing,100029,China; 7.School of Biomedical Engineering,Wenzhou Medical University,Wenzhou,325035,China; 8.School of Mechatronic Engineering and Automation,Shanghai University,Shanghai,200072,China |
推荐引用方式 GB/T 7714 | Ai, Zhou,Zhao, Wenchao,Yi, Zao,et al. Four-wave peak mid-infrared graphene surface plasmons absorber based on circular and orthogonal double ellipses[J]. DIAMOND AND RELATED MATERIALS,2023,135. |
APA | Ai, Zhou., Zhao, Wenchao., Yi, Zao., Liu, Huan., Yang, Hua., ... & Fu, Jingqi. (2023). Four-wave peak mid-infrared graphene surface plasmons absorber based on circular and orthogonal double ellipses. DIAMOND AND RELATED MATERIALS, 135. |
MLA | Ai, Zhou,et al."Four-wave peak mid-infrared graphene surface plasmons absorber based on circular and orthogonal double ellipses".DIAMOND AND RELATED MATERIALS 135(2023). |
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